Atomic imaging of nucleation of trimethylaluminum on clean and H2O functionalized Ge(100) surfaces

Effect of H2O chemisorption on passivation of Ge(100) surface studied by scanning tunneling microscopy

(2011) Joon Sung Lee et al.   SURFACE SCIENCE

Atomic imaging of the monolayer nucleation and unpinning of a compound semiconductor surface during atomic layer deposition

(2010) Jonathon B. Clemens et al.   JOURNAL OF CHEMICAL PHYSICS

Characterization of the “clean-up” of the oxidized Ge(100) surface by atomic layer deposition

(2009) M. Milojevic et al.   APPLIED PHYSICS LETTERS

Oxidant prepulsing of Ge (100) prior to atomic layer deposition of Al2O3: In situ surface characterization

(2009) Shankar Swaminathan et al.   APPLIED PHYSICS LETTERS

Adsorption and Thermal Reaction of Short-Chain Iodoalkanes on Ge(100)

(2009) P. Y. Chuang et al.   Journal of Physical Chemistry C

Study of the Surface Reactions in ALD Hafnium Aluminates

(2009) L. Nyns et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Formation of an oxide-free Ge∕TiO2 interface by atomic layer deposition on brominated Ge

(2008) Pendar Ardalan et al.   APPLIED PHYSICS LETTERS

High-k gate stack on germanium substrate with fluorine incorporation

(2008) Ruilong Xie et al.   APPLIED PHYSICS LETTERS

Effects of Si passivation on Ge metal-insulator-semiconductor interface properties and inversion-layer hole mobility

(2008) Noriyuki Taoka et al.   APPLIED PHYSICS LETTERS

Evidence of low interface trap density in GeO2∕Ge metal-oxide-semiconductor structures fabricated by thermal oxidation

(2008) Hiroshi Matsubara et al.   APPLIED PHYSICS LETTERS

Interface control of high-k gate dielectrics on Ge

(2008) M. Caymax et al.   APPLIED SURFACE SCIENCE

Ge-Interface Engineering With Ozone Oxidation for Low Interface-State Density

(2008) Duygu Kuzum et al.   IEEE ELECTRON DEVICE LETTERS

High-k/Ge MOSFETs for future nanoelectronics

(2008) Yoshiki Kamata   Materials Today

Passivation of Ge(100)∕GeO[sub 2]∕high-κ Gate Stacks Using Thermal Oxide Treatments

(2007) F. Bellenger et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY