Mesoscopic analysis of leakage current suppression in ZrO2/Al2O3/ZrO2 nano-laminates

Conduction Mechanisms and Breakdown Characteristics of $\hbox{Al}_{2}\hbox{O}_{3}$-Doped $\hbox{ZrO}_{2}$ High-$k$ Dielectrics for Three-Dimensional Stacked Metal–Insulator–Metal Capacitors

(2012) Steve Knebel et al.   IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY

Role of defect relaxation for trap-assisted tunneling in high-κthin films: A first-principles kinetic Monte Carlo study

(2012) Gunther Jegert et al.   PHYSICAL REVIEW B

Reliability of Al2O3-doped ZrO2 high-k dielectrics in three-dimensional stacked metal-insulator-metal capacitors

(2010) Dayu Zhou et al.   JOURNAL OF APPLIED PHYSICS

Local charge transport in nanoscale amorphous and crystalline regions of high-k (Zr02)0.8(Al2O3)0.2 thin films

(2009) Dominik Martin et al.   APPLIED PHYSICS LETTERS

Influence of the amorphous/crystalline phase of Zr1−xAlxO2 high-k layers on the capacitance performance of metal insulator metal stacks

(2009) Albena Paskaleva et al.   JOURNAL OF APPLIED PHYSICS

Influence of N2 and NH3 annealing on the nitrogen incorporation and k-value of thin ZrO2 layers

(2009) W. Weinreich et al.   JOURNAL OF APPLIED PHYSICS

Electric modulation of conduction in multiferroic Ca-doped BiFeO3 films

(2009) C.-H. Yang et al.   NATURE MATERIALS

Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics

(2008) Vasil Yanev et al.   APPLIED PHYSICS LETTERS