4.6 Article

On the origin of an additional Raman mode at 275 cm-1 in N-doped ZnO thin films

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JOURNAL OF APPLIED PHYSICS
卷 111, 期 6, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.3697971

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资金

  1. Research Foundation for the Doctoral Program of High Education of China [20093401110004]
  2. Science Foundation of Anhui Province [090414177]
  3. West Anhui University [2009LW027]
  4. National Science Foundation [EPS-1003970]
  5. Chinese Scholarship Council
  6. EPSCoR
  7. Office Of The Director [1003970] Funding Source: National Science Foundation

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A systematic investigation on the optical properties of N-doped ZnO thin films was performed in order to understand the origin of an additional Raman mode at 275 cm(-1). This Raman peak was observable only at N-2 pressures lower than 30 Pa during pulsed laser deposition. Its intensity decreased with an increase of N-2 pressures and eventually vanished at pressures above 30 Pa. N substitution of O (N-O) was identified by photoluminescence and x-ray photoelectron spectroscopy and correlated well with the Raman intensity. The electrical measurements showed significant changes in resistivity, charge carrier concentration, and mobility due to the presence of N acceptors. Investigations on undoped ZnO films grown in Ar without N-2 further confirm that N doping plays a key role in the Raman scattering. The experimental data indicate that the Raman mode originates from N-O related complexes, likely in the form of Zn-i-N-O. These investigations help to understand the doping mechanisms and underlying physics of the additional Raman mode in the ZnO films. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3697971]

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