期刊
JOURNAL OF APPLIED PHYSICS
卷 111, 期 6, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3697971
关键词
-
资金
- Research Foundation for the Doctoral Program of High Education of China [20093401110004]
- Science Foundation of Anhui Province [090414177]
- West Anhui University [2009LW027]
- National Science Foundation [EPS-1003970]
- Chinese Scholarship Council
- EPSCoR
- Office Of The Director [1003970] Funding Source: National Science Foundation
A systematic investigation on the optical properties of N-doped ZnO thin films was performed in order to understand the origin of an additional Raman mode at 275 cm(-1). This Raman peak was observable only at N-2 pressures lower than 30 Pa during pulsed laser deposition. Its intensity decreased with an increase of N-2 pressures and eventually vanished at pressures above 30 Pa. N substitution of O (N-O) was identified by photoluminescence and x-ray photoelectron spectroscopy and correlated well with the Raman intensity. The electrical measurements showed significant changes in resistivity, charge carrier concentration, and mobility due to the presence of N acceptors. Investigations on undoped ZnO films grown in Ar without N-2 further confirm that N doping plays a key role in the Raman scattering. The experimental data indicate that the Raman mode originates from N-O related complexes, likely in the form of Zn-i-N-O. These investigations help to understand the doping mechanisms and underlying physics of the additional Raman mode in the ZnO films. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3697971]
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据