In situ measurement of plasma charging on SiO2 hole bottoms and reduction by negative charge injection during etching

标题
In situ measurement of plasma charging on SiO2 hole bottoms and reduction by negative charge injection during etching
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume 254, Issue 12, Pages 3696-3709
出版商
Elsevier BV
发表日期
2007-11-02
DOI
10.1016/j.apsusc.2007.10.070

向作者/读者发起求助以获取更多资源

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started