Increase in oxide hole trap density associated with nitrogen incorporation at the SiO2/SiC interface

标题
Increase in oxide hole trap density associated with nitrogen incorporation at the SiO2/SiC interface
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 103, Issue 12, Pages 124513
出版商
AIP Publishing
发表日期
2008-06-25
DOI
10.1063/1.2940736

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