Observation of band bending of metal/high-k Si capacitor with high energy x-ray photoemission spectroscopy and its application to interface dipole measurement

标题
Observation of band bending of metal/high-k Si capacitor with high energy x-ray photoemission spectroscopy and its application to interface dipole measurement
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 104, Issue 10, Pages 104908
出版商
AIP Publishing
发表日期
2008-11-20
DOI
10.1063/1.3021461

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