Highly Uniform, Self-Compliance, and Forming-Free ALD $\hbox{HfO}_{2}$ -Based RRAM With Ge Doping

标题
Highly Uniform, Self-Compliance, and Forming-Free ALD $\hbox{HfO}_{2}$ -Based RRAM With Ge Doping
作者
关键词
-
出版物
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 59, Issue 4, Pages 1203-1208
出版商
Institute of Electrical and Electronics Engineers (IEEE)
发表日期
2012-02-04
DOI
10.1109/ted.2012.2182770

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