Electrical Properties of the Thin-Film Transistor With an Indium–Gallium–Zinc Oxide Channel and an Aluminium Oxide Gate Dielectric Stack Formed by Solution-Based Atmospheric Pressure Deposition

标题
Electrical Properties of the Thin-Film Transistor With an Indium–Gallium–Zinc Oxide Channel and an Aluminium Oxide Gate Dielectric Stack Formed by Solution-Based Atmospheric Pressure Deposition
作者
关键词
-
出版物
IEEE ELECTRON DEVICE LETTERS
Volume 33, Issue 6, Pages 851-853
出版商
Institute of Electrical and Electronics Engineers (IEEE)
发表日期
2012-05-31
DOI
10.1109/led.2012.2192902

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