Al capping layers for nondestructive x-ray photoelectron spectroscopy analyses of transition-metal nitride thin films

标题
Al capping layers for nondestructive x-ray photoelectron spectroscopy analyses of transition-metal nitride thin films
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 33, Issue 5, Pages 05E101
出版商
American Vacuum Society
发表日期
2015-03-31
DOI
10.1116/1.4916239

向作者/读者发起求助以获取更多资源

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started