Effects of plasma-enhanced chemical vapor deposition (PECVD) on the carrier lifetime of Al2O3 passivation stack

出版年份 2015 全文链接

标题

作者

关键词

Atomic layer deposition, Surface passivation, Carrier lifetime, Al<sub>2</sub>O<sub>3</sub>, SiON, Plasma- enhanced chemical vapor deposition, Crystalline silicon solar cell

出版物

JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Volume 67, Issue 6, Pages 995-1000

出版商

Korean Physical Society

发表日期

2015-10-02

DOI

10.3938/jkps.67.995

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