Effect of the nitrogen flow on the properties of Si-C-N amorphous thin films produced by magnetron sputtering

Comparative nanoindentation of single crystals of hard and superhard oxidess

(2014) N. Dub et al.   Journal of Superhard Materials

Effect of air annealing on mechanical properties and structure of SiCxNy magnetron sputtered films

(2013) V. Kulikovsky et al.   SURFACE & COATINGS TECHNOLOGY

The structure, surface topography and mechanical properties of Si–C–N films fabricated by RF and DC magnetron sputtering

(2011) Zhifeng Shi et al.   APPLIED SURFACE SCIENCE

Onset Plastic Deformation and Cracking Behavior of Silicon Carbide under Contact Load at Room Temperature

(2011) Xiaofeng Zhao et al.   JOURNAL OF THE AMERICAN CERAMIC SOCIETY

Mechanical and thermal physical properties of amorphous SiCN(O) ceramic bulks prepared by hot-press sintering

(2011) Z.L. Sun et al.   MATERIALS LETTERS

Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations

(2011) Casper Pusch et al.   SURFACE & COATINGS TECHNOLOGY

CONTINUOUS STIFFNESS MEASUREMENT DURING INSTRUMENTED INDENTATION TESTING

(2010) J. Hay et al.   EXPERIMENTAL TECHNIQUES

Structural analysis of silicon carbon nitride films prepared by vapor transport-chemical vapor deposition

(2010) Y. Awad et al.   JOURNAL OF APPLIED PHYSICS

The photoluminescence of SiCN thin films prepared by C+ implantation into α-SiNx:H

(2010) Yuzhen Liu et al.   THIN SOLID FILMS

IR studies of SiCN films deposited by RF sputtering method

(2009) Zhiyong Chen et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Structural and mechanical properties of amorphous silicon carbonitride films prepared by vapor-transport chemical vapor deposition

(2009) Y. Awad et al.   SURFACE & COATINGS TECHNOLOGY

Study of structural and electronic environments of hydrogenated amorphous silicon carbonitride (a-SiCN:H) films deposited by hot wire chemical vapor deposition

(2008) Bibhu P. Swain et al.   APPLIED SURFACE SCIENCE

Microstructural and Chemical Evolution of –CH[sub 3]-Incorporated (Low-k) SiCO(H) Films Prepared by Dielectric Barrier Discharge Plasma

(2007) Abhijit Majumdar et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY