4.3 Article

Oxide-confined 850 nm VCSELs operating at bit rates up to 40 Gbit/s

期刊

ELECTRONICS LETTERS
卷 45, 期 10, 页码 501-502

出版社

INST ENGINEERING TECHNOLOGY-IET
DOI: 10.1049/el.2009.0552

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资金

  1. EU [224211]
  2. DFG
  3. RFFI
  4. DLR
  5. St. Petersburg Scientific Centre RAS
  6. Presidium RAS
  7. Russian Federal Agency of Education

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Oxide-confined 850 nm vertical-cavity surface-emitting lasers operating at 40 Gbit/s at current densities similar to 10 kA/cm(2) are realised. The deconvoluted rise time of the device is below 10 ps and remains hardly temperature sensitive up to 100 degrees C.

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