Effect of Arsenic Implantation Dose on p-Type ZnO Films Obtained via Thermal Diffusion from Silicon Substrates

标题
Effect of Arsenic Implantation Dose on p-Type ZnO Films Obtained via Thermal Diffusion from Silicon Substrates
作者
关键词
-
出版物
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 13, Issue 11, Pages H373
出版商
The Electrochemical Society
发表日期
2010-08-19
DOI
10.1149/1.3479688

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