Article
Chemistry, Multidisciplinary
Yue Yang, Xiao-Ying Zhang, Chen Wang, Fang-Bin Ren, Run-Feng Zhu, Chia-Hsun Hsu, Wan-Yu Wu, Dong-Sing Wuu, Peng Gao, Yu-Jiao Ruan, Shui-Yang Lien, Wen-Zhang Zhu
Summary: Amorphous gallium oxide thin films were grown using plasma-enhanced atomic layer deposition. The films exhibited decreasing band gap energy and increased density as the temperature increased. The higher substrate temperature also resulted in increased surface roughness. Films grown at temperatures below 200 degrees C were amorphous, while the film grown at 250 degrees C showed slight crystallinity.
Article
Materials Science, Coatings & Films
Tomas F. Babuska, Michael T. Dugger, Karl A. Walczak, Ping Lu, Adam Schwartzberg, Shaul Aloni, Tevye R. Kuykendall, John F. Curry
Summary: Molybdenum disulfide (MoS2) is a versatile material that can be used in various forms, such as particles, films, and coatings, for applications ranging from semiconductors to aerospace lubricants. Physical vapor deposition (PVD) and atomic layer deposition (ALD) have been commonly used to produce MoS2 coatings, but with different limitations. This work demonstrates the use of ultra-thin low temperature ALD MoS2 coatings as promising solid lubricants for aerospace applications requiring low-temperature processing and complex geometries.
SURFACE & COATINGS TECHNOLOGY
(2023)
Article
Chemistry, Multidisciplinary
Ming-Jie Zhao, Zhi-Xuan Zhang, Chia-Hsun Hsu, Xiao-Ying Zhang, Wan-Yu Wu, Shui-Yang Lien, Wen-Zhang Zhu
Summary: The study successfully prepared indium oxide films using a remote plasma as oxidant, showing that the growth mode and properties of the films can be efficiently tuned by varying the substrate temperature.
Article
Chemistry, Analytical
Qiumei Wang, Chenyu Wang, Xiao Chang, Xianghong Liu, Jun Zhang
Summary: By depositing Pd and Rh metals on porous In2O3 thin films using ALD technology, high and fast response to NO2 at room temperature was achieved. The Pd/Rh catalysts greatly improved the interaction and charge transfer between In2O3 and NO2.
SENSORS AND ACTUATORS B-CHEMICAL
(2023)
Article
Materials Science, Coatings & Films
Adnan Mohammad, Krishna D. Joshi, Dhan Rana, Saidjafarzoda Ilhom, Barrett Wells, Brian Willis, Boris Sinkovic, A. K. Okyay, Necmi Biyikli
Summary: This study reports on the low-temperature hollow-cathode plasma-enhanced atomic layer deposition (ALD) of crystalline vanadium oxide thin films. Both plasma-ALD techniques were able to synthesize polycrystalline V2O5 films at 150°C, which were then converted into different crystalline VOx states, including VO2, through postdeposition thermal annealing. VO2 exhibited interesting phase-change properties with a metal-insulator transition around 70°C.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
(2023)
Article
Chemistry, Multidisciplinary
Liangge Xu, Jinye Yang, Kun Li, Lei Yang, Jiaqi Zhu
Summary: This study investigates the effect of post-deposition annealing process on the microstructure and optoelectronic properties of indium-hydroxide-doped thin films. The results show that the annealed films have high carrier mobility and transmittance, and exhibit excellent shielding performance against radar electromagnetic waves. This provides a guideline for fabricating lightweight, thin, and multi-functional shielding infrared transparent materials.
Article
Chemistry, Multidisciplinary
Juho Heiska, Olli Sorsa, Tanja Kallio, Maarit Karppinen
Summary: Two new atomic/molecular layer deposition processes were developed for depositing crystalline metal-organic thin films using 1,4-benzenedisulfonate as the organic linker and either Cu or Li as the metal node. The resulting films can be transformed from hydrated phases to unhydrated phases, with the unhydrated Li-BDS films showing potential for applications as thin film solid polymer Li-ion conductors.
CHEMISTRY-A EUROPEAN JOURNAL
(2021)
Article
Chemistry, Physical
Teng-Jan Chang, Yu-Sen Jiang, Sheng-Han Yi, Chun-Yi Chou, Chin- Wang, Hsin-Chih Lin, Miin-Jang Chen
Summary: This paper introduces an atomic layer annealing (ALA) technique to achieve ferroelectricity in sub-10 nm HZO thin films with low thermal budget. The ALA treatment on each HfO2 monolayer is found to be superior in terms of crystallinity and ferroelectric properties compared to the treatment on each ZrO2 monolayer. The study demonstrates the effectiveness of ALA in atomic tailoring of nanoscale thin films at low temperature.
APPLIED SURFACE SCIENCE
(2022)
Article
Materials Science, Multidisciplinary
Zhi-Xuan Zhang, Chia-Hsun Hsu, Pao-Hsun Huang, Ming-Jie Zhao, Duan-Chen Peng, Wan-Yu Wu, Chien-Jung Huang, Wen-Zhang Zhu, Shui-Yang Lien
Summary: This paper investigates the optical, structural, and electrical properties of PEALD In2O3 thin films under different annealing temperatures. The experimental results show that annealing treatment can remove oxygen defects and carbon impurities in the films, affecting the electrical conductivity of the films.
Article
Chemistry, Physical
Mohd Zahid Ansari, Petr Janicek, Dip K. Nandi, Stanislav Slang, Marek Bouska, Hongjun Oh, Bonggeun Shong, Soo-Hyun Kim
Summary: In this study, high-quality stoichiometric SnS thin films were successfully prepared by atomic layer deposition (ALD) using a liquid divalent Sn precursor and H2S. The films exhibited different growth phases at different temperatures, with optoelectronic properties evaluated by spectroscopic ellipsometry (SE) analysis.
APPLIED SURFACE SCIENCE
(2021)
Article
Chemistry, Multidisciplinary
S. He, A. Bahrami, X. Zhang, J. Julin, M. Laitinen, K. Nielsch
Summary: In this study, antimony (Sb) metal thin films were deposited using atomic layer deposition (ALD) with new precursor combinations. The growth behaviors and oxidation of the Sb thin films were investigated at different deposition temperatures. The results showed that the Sb films made using the Sb(OEt)3/(SiMe3)3Sb combination and deposited at 75°C had high purity and slightly higher electrical conductivities compared to previous Sb-ALD films. This approach of Sb ALD can accelerate the application of pure metals in electronic device fabrication.
MATERIALS TODAY CHEMISTRY
(2023)
Article
Chemistry, Physical
Jiahui Xu, Shizheng Li, Wenjing Zhang, Shang Yan, Cui Liu, Xiao Yuan, Xiaojun Ye, Hongbo Li
Summary: This study investigates the effects of deposition and annealing temperature on the growth and surface passivation of ALD-SiO2 films. Higher deposition temperature improves growth rate and refractive index, while high-temperature annealing enhances surface passivation.
APPLIED SURFACE SCIENCE
(2021)
Article
Materials Science, Coatings & Films
Lauri Aarik, Hugo Mandar, Aivar Tarre, Helle-Mai Piirsoo, Jaan Aarik
Summary: The mechanical properties of atomic-layer deposited alumina thin films with different phases were characterized, showing that the hardness and elastic modulus of the films were positively correlated with their crystallinity and density.
SURFACE & COATINGS TECHNOLOGY
(2022)
Article
Chemistry, Physical
Zihong Gao, Chengli Zhang, Junhua Gao, Qiang Wang, Guanglong Xu, Hongtao Cao, Hongliang Zhang
Summary: This study demonstrates a low-temperature atomic layer deposition (ALD) of copper on a treated polyimide surface using Cu(hfac)(2) and Et2Zn precursors. The resulting copper thin films are highly conformal, continuous, and have low resistivity. The process combines self-limiting ALD and CVD-like reactions, with a growth rate of 0.079 nm/cycle. A model is proposed to explain the nucleation and growth kinetics of copper ALD on treated polyimide substrates.
APPLIED SURFACE SCIENCE
(2023)
Article
Chemistry, Multidisciplinary
Umme Farva, Hyeong Woo Lee, Ri-Na Kim, Dong-Gun Lee, Dong-Won Kang, Jeha Kim
Summary: In this study, high-quality indium oxide thin films were prepared via atomic layer deposition as an electron transport layer for perovskite solar cells. The properties of the films were significantly affected by growth temperature, with films grown at higher temperatures exhibiting improved crystalline structure and conductivity. The device with the ALD-In2O3 film deposited at 250 degrees Celsius showed a superior power conversion efficiency of 10.97% compared to other conditions.
Article
Chemistry, Physical
Nadadur Veeraraghavan Srinath, Hilde Poelman, Lukas Buelens, Jolien Dendooven, Marie-Francoise Reyniers, Guy B. Marin, Vladimir V. Galvita
Summary: CO2-assisted propane dehydrogenation was studied on Pt-Sn/MgAl2O4 catalysts, and the effects of reduction and oxidation on the catalyst's structure and activity were investigated. It was found that CO2 can enhance the conversion of propane, but high concentrations of CO2 can lead to catalyst deactivation.
JOURNAL OF CATALYSIS
(2022)
Article
Chemistry, Inorganic & Nuclear
Lowie Henderick, Ruben Blomme, Matthias Minjauw, Jonas Keukelier, Johan Meersschaut, Jolien Dendooven, Philippe Vereecken, Christophe Detavernier
Summary: A plasma-enhanced ALD process has been developed for depositing nickel phosphate, showing potential applications in energy storage and conversion devices. The addition of extra oxygen plasma can enhance the stoichiometry of the deposited layer towards close to pure nickel phosphate. The electrochemical studies on the PE-ALD deposited nickel phosphate layers demonstrate high capacity and good rate behavior, attributed to possible conversion or alloying reactions.
DALTON TRANSACTIONS
(2022)
Article
Chemistry, Inorganic & Nuclear
Matthias M. Minjauw, Ji-Yu Feng, Timo Sajavaara, Christophe Detavernier, Jolien Dendooven
Summary: This work presents the use of ruthenium tetroxide (RuO4) as a co-reactant in atomic layer deposition (ALD), achieving ALD of ruthenium-containing metal oxides and demonstrating self-limiting surface reactions. Different processes result in films with varied metal ratios and impurities, all of which are amorphous.
DALTON TRANSACTIONS
(2022)
Article
Chemistry, Physical
Evgeniy A. Redekop, Hilde Poelman, Matthias Filez, Ranjith K. Ramachandran, Jolien Dendooven, Christophe Detavernier, Guy B. Marin, Unni Olsbye, Vladimir V. Galvita
Summary: The spectro-kinetic characterization of complex catalytic materials is essential for understanding and improving various chemical technologies. This study proposes a method that combines temporal analysis of products pulse-response kinetic experiments with ambient pressure X-ray photoelectron spectroscopy to obtain a comprehensive understanding of catalytic reactions. The results show that this tandem methodology is effective in monitoring coke deposition and providing quantitative kinetic descriptors.
FARADAY DISCUSSIONS
(2022)
Article
Chemistry, Physical
Nithin Poonkottil, Ranjith K. Ramachandran, Eduardo Solano, Nadadur Veeraraghavan Srinath, Ji-Yu Feng, Andreas Werbrouck, Michiel Van Daele, Matthias Filez, Matthias M. Minjauw, Hilde Poelman, Alessandro Coati, Christophe Detavernier, Jolien Dendooven
Summary: This study presents a flexible strategy for the deposition of phase-controlled bimetallic nanoparticles (BMNPs) by vapor-phase titration of a secondary metal to a pre-deposited monometallic nanoparticle (NP) host. The method allows for precise control over the structure and composition of the BMNPs through substrate temperature control and the addition of hydrogen gas. The approach provides a single-step, selective vapor-phase conversion of the monometallic NPs into phase-controlled BMNPs with potential applications in catalysis.
JOURNAL OF PHYSICAL CHEMISTRY C
(2022)
Article
Chemistry, Physical
Andreas Werbrouck, Felix Mattelaer, Arpan Dhara, Mikko Nisula, Matthias Minjauw, Frans Munnik, Jolien Dendooven, Christophe Detavernier
Summary: This work reports on the atomic layer deposition process combining lithium hexamethyl disilazide (LiHMDS) and trimethylphosphate (TMP), and studies the impact of adding a trimethylaluminum (TMA) pulse to this process. The interaction between TMA and TMP plays a key role in this process, and the addition of TMA leads to higher growth and structural changes in the deposited layer. The amorphous mix of Li4P2O7 and Li3PO4 in the films grown with TMA improves the conductive properties of the material, making it potentially useful for modifying electrode-electrolyte interfaces in lithium-ion batteries.
JOURNAL OF MATERIALS CHEMISTRY A
(2022)
Article
Nanoscience & Nanotechnology
Sofie S. T. Vandenbroucke, Lowie Henderick, Louis L. De Taeye, Jin Li, Karolien Jans, Philippe M. Vereecken, Jolien Dendooven, Christophe Detavernier
Summary: This study reports the deposition of titanium carboxylate thin films via molecular layer deposition (MLD) on lithium-ion battery cathodes. The films have good performance in both protecting the cathodes and accommodating volume changes of the electrode.
ACS APPLIED MATERIALS & INTERFACES
(2022)
Article
Chemistry, Applied
Bo Zhao, Jin Li, Maxime Guillaume, Jolien Dendooven, Christophe Detavernier
Summary: The study reveals that the pristine Li surface is naturally covered with an oxidized layer, which can be efficiently removed by plasma treatments to obtain different surface compositions like metallic Li, Li2O, and Li3N. Among these, the Li3N coated Li electrode shows superior stability in symmetric Li metal batteries.
JOURNAL OF ENERGY CHEMISTRY
(2022)
Review
Physics, Applied
Lowie Henderick, Arpan Dhara, Andreas Werbrouck, Jolien Dendooven, Christophe Detavernier
Summary: Due to their unique properties, metal phosphate coatings are widely used in various applications. Atomic layer deposition is a precise method for producing high-quality coatings. This article discusses different strategies and mechanisms of atomic layer deposition for phosphate materials, and summarizes the applications of metal phosphates in energy storage and other emerging technologies.
APPLIED PHYSICS REVIEWS
(2022)
Article
Chemistry, Physical
Matthias Filez, Ji-Yu Feng, Matthias M. Minjauw, Eduardo Solano, Nithin Poonkottil, Michiel Van Daele, Ranjith K. Ramachandran, Chen Li, Sara Bals, Hilde Poelman, Christophe Detavernier, Jolien Dendooven
Summary: This paper introduces a new gas-phase sequence, ALD+, which combines multiple functionalities to tailor the properties of bimetallic thin films and nanoparticles, expanding upon traditional atomic layer deposition methods.
CHEMISTRY OF MATERIALS
(2022)
Article
Materials Science, Multidisciplinary
Wouter Devulder, Daniele Garbin, Sergiu Clima, Gabriele Luca Donadio, Andrea Fantini, Bogdan Govoreanu, Christophe Detavernier, Larry Chen, Michael Miller, Ludovic Goux, Sven Van Elshocht, Johan Swerts, Romain Delhougne, Gouri Sankar Kar
Summary: This paper investigates the thermal stability of a wide range of ternary and quaternary (Si)GeAsTe alloy thin films. The study shows that Si doping improves the thermal stability and capping the films with a W cap avoids material loss. An optimal chalcogenide composition of As50Te20Ge20Si10 is identified for electrical characterization.
Article
Nanoscience & Nanotechnology
Yanlu Li, Claudio Bellani, Nebiyu Yebo, Jolien Dendooven, Jin Won Seo, Christophe Detavernier, Roel Baets, Johan A. Martens, Sreeprasanth Pulinthanathu Sree
Summary: This study demonstrates the integration of nanoporous silica-alumina films on silicon nanophotonic chips for selective NH3 detection. The reversible nature of the sensor is investigated in relation to preadsorbed water vapor.
ACS APPLIED NANO MATERIALS
(2022)
Article
Chemistry, Physical
Nithin Poonkottil, Eduardo Solano, Arbresha Muriqi, Matthias M. Minjauw, Matthias Filez, Michael Nolan, Christophe Detavernier, Jolien Dendooven
Summary: Nanoscale patterning of inorganics is crucial for advanced electronic, photonic, and energy devices. In this study, the sequential infiltration synthesis (SIS) method was used to fabricate Ru metal nanostructures in polystyrene-block-polymethyl methacrylate (PS-b-PMMA) templates without any pretreatment. The selective interaction between RuO4 and the aromatic C=C and C-H groups in PS allows for the formation of Ru nanolines.
CHEMISTRY OF MATERIALS
(2022)
Article
Engineering, Electrical & Electronic
Liad Tadmor, Enrico Brusaterra, Eldad Bahat Treidel, Frank Brunner, Nicole Bickel, Sofie S. T. Vandenbroucke, Christophe Detavernier, Joachim Wuerfl, Oliver Hilt
Summary: This work investigates the properties and robustness of post metallization annealed Al2O3 atomic layers on n-type GaN in terms of chemical, physical, and electrical aspects. The study demonstrates a gate-first process flow with subsequent ohmic contact formation at temperatures up to 600 degrees C using planar metal insulator capacitors. The results show no new bonds or crystallization in the Al2O3 layer due to annealing, but degradation is observed at 600 degrees C. The annealing temperature affects the oxide depletion and deep depletion capacitances, resulting in a reduction of the flat band voltage to zero.
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
(2023)
