Atomic Layer Deposition of AlF3Using Trimethylaluminum and Hydrogen Fluoride

标题
Atomic Layer Deposition of AlF3Using Trimethylaluminum and Hydrogen Fluoride
作者
关键词
-
出版物
Journal of Physical Chemistry C
Volume 119, Issue 25, Pages 14185-14194
出版商
American Chemical Society (ACS)
发表日期
2015-05-28
DOI
10.1021/acs.jpcc.5b02625

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