High-Density 2D Homo- and Hetero- Plasmonic Dimers with Universal Sub-10-nm Gaps

Fabrication of high-density plasmonic dimers on a large (wafer) scale is crucial for applications in surface-enhanced spectroscopy, bio- and molecular sensing, and optoelectronics. Here, we present an experimental approach based on nanoimprint lithography and shadow evaporation that allows for the fabrication of high-density, large-scale homo- (Au-Au and Ag-Ag) and hetero-(Au-Ag) dimer substrates with precise and consistent sub-10-nm gaps. We performed scanning electron, scanning transmission electron, and atomic force microscopy studies along with a complete electron energy-loss spectroscopy (EELS) characterization. We observed distinct plasmonic modes on these dimers, which are well interpreted by finite-difference time-domain (FDTD) and plasmon hybridization calculations.