期刊
DIAMOND AND RELATED MATERIALS
卷 20, 期 4, 页码 564-567出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.diamond.2011.03.002
关键词
Diamond; Waveguide; Inkjet printing; Plasma etching
类别
资金
- EPSRC [EP/D078555/1, EP/G00014X/1]
- EPSRC [EP/I029141/1, EP/E064450/1, EP/E006000/1, EP/D078555/1, EP/G00014X/1] Funding Source: UKRI
- Engineering and Physical Sciences Research Council [EP/E064450/1, EP/G00014X/1, EP/E006000/1, EP/D078555/1, EP/I029141/1] Funding Source: researchfish
A new approach to fabricate large cross-section edge-coupled waveguides on free-standing thin diamond substrates is reported. Combining inkjet printing of photoresist multilayers with photolithographic patterning, both edge and 'coffee stain' effects were successfully eliminated, allowing the fabrication of well-defined, millimetre-scale uniform photoresist micro-stripes which extend to the very edge of the diamond substrate. Subsequent transfer of these micro-stripe structures into diamond by inductively coupled plasma (ICP) etching allowed long edge-coupled waveguides in diamond to be made. Guided wave propagation in these diamond waveguides was also confirmed. (C) 2011 Elsevier B.V. All rights reserved.
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