期刊
DIAMOND AND RELATED MATERIALS
卷 17, 期 7-10, 页码 1164-1168出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.diamond.2008.03.018
关键词
diamond film; chemical vapor deposition; plasma CVD; reactive ion etching (RIE); microstructure
Reactive ion etching of (100) CVD diamond films in 02 has been performed using a 13.56 MHz capacitively coupled reactor at pressures of 20 mTorr-100 mTorr and r.f. powers of 100 W-300 W. The formation of columnar structures was observed at the grain boundaries whereas the (100) facets were etched to yield a smooth surface under optimum conditions. For comparison, the RIE of single, isolated cubo-octahedral crystallites produced smooth (100) facets and roughened (111) surfaces reminiscent of the micro-columnar structures evident in the films. (C) 2008 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据