4.6 Article Proceedings Paper

Unusual morphology of CVD diamond surfaces after RIE

期刊

DIAMOND AND RELATED MATERIALS
卷 17, 期 7-10, 页码 1164-1168

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ELSEVIER SCIENCE SA
DOI: 10.1016/j.diamond.2008.03.018

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diamond film; chemical vapor deposition; plasma CVD; reactive ion etching (RIE); microstructure

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Reactive ion etching of (100) CVD diamond films in 02 has been performed using a 13.56 MHz capacitively coupled reactor at pressures of 20 mTorr-100 mTorr and r.f. powers of 100 W-300 W. The formation of columnar structures was observed at the grain boundaries whereas the (100) facets were etched to yield a smooth surface under optimum conditions. For comparison, the RIE of single, isolated cubo-octahedral crystallites produced smooth (100) facets and roughened (111) surfaces reminiscent of the micro-columnar structures evident in the films. (C) 2008 Elsevier B.V. All rights reserved.

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