4.4 Article Proceedings Paper

The annealing effect on damp heat stability of AGZO thin films prepared by DC moving magnetron sputtering

期刊

CURRENT APPLIED PHYSICS
卷 11, 期 3, 页码 S333-S336

出版社

ELSEVIER
DOI: 10.1016/j.cap.2011.01.014

关键词

TCO; AGZO; DC sputtering; Damp heat stability

向作者/读者索取更多资源

In the research, we report the results on the damp heat stability test for the annealing effect of aluminum and gallium co-doped ZnO (AGZO) thin films. The prepared AGZO thin films (AGZO-RT) by DC moving magnetron sputtering at room temperature were exhibited thicknesses of 150 nm and the sheet resistances of 60-70 Omega/sq. And the part of the deposition, it was annealed in vacuum at 300 degrees C for 18 min. The damp heat tests of the two samples (AGZO-RT, AGZO-AN) were carried out in a chamber with 90% of relative humidity and 60 degrees C of temperature. As the time of the damp heat test increased, the electrical properties of AGZO-RT were more deteriorated than AGZO-AN. The sheet resistance by damp heat to the two samples increased more than three times after 1000 h. The various analytical methods were measured to the electrical, optical and structural properties in the damp heat condition tested about the two thin films, and the results will be discussed. (C) 2011 Elsevier B.V. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.4
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据