4.4 Article

A novel one-step electrochemical method to obtain crystalline titanium dioxide films at low temperature

期刊

CURRENT APPLIED PHYSICS
卷 9, 期 1, 页码 243-248

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.cap.2008.02.004

关键词

semiconductors; thin films; titanium dioxide; crystal growth; electrodeposition

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A crystalline titanium dioxide (TiO2) thin film on various metal substrates such as hot-dip-galvanized (HDG), electrochemically galvanized (EG) and cold rolled steel (CRS) has been successfully prepared for the first time by simple one-step electrodeposition method from alkaline aqueous solution containing potassium titanium oxalate and hydroxylamine. The as-grown titanium dioxide films are composed of a mixture of anatase, rutile and brookite structures and have a good crystalline state. The present investigation reveals that the electrochemical deposition of crystalline titanium dioxide on different metal Substrates from single electrochemical bath is possible and very promising as a preparation method for industrial applications. (C) 2008 Elsevier B.V. All rights reserved.

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