Precursor design and reaction mechanisms for the atomic layer deposition of metal films

标题
Precursor design and reaction mechanisms for the atomic layer deposition of metal films
作者
关键词
-
出版物
COORDINATION CHEMISTRY REVIEWS
Volume 257, Issue 23-24, Pages 3271-3281
出版商
Elsevier BV
发表日期
2013-04-04
DOI
10.1016/j.ccr.2013.03.028

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