期刊
COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS
卷 313, 期 -, 页码 383-386出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.colsurfa.2007.05.086
关键词
triarylsulfonium salts; photoacid generator (PAG); atomic force microscope (AFM); lithography
Photoacid generators (PAGs) have been widely used as a key component in the development of chemically amplified photoresist. In this study, a PAG with good thermal stability and an electron-withdrawing group was applied to AFM anodization lithography. Specifically, triarylsulfonium salts (TAS) such as a diphenyl(4-tert-butoxycarbomethoxyphenyl)-sulfonium triflate (DTCPS-Tf) and triphenyl-sulfonium triflate (TPS-Tf) were used successfully to fabricate anodized nanostructures by AFM anodization lithography. In addition, the effect of electron-withdrawing materials and optimized lithographic conditions were studied through a systematic alteration of lithographic factors such as applied voltage, lithographic speed, and humidity. (C) 2007 Elsevier B.V. All rights reserved.
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