Atomic Layer Deposition of Gallium Sulfide Films Using Hexakis(dimethylamido)digallium and Hydrogen Sulfide

标题
Atomic Layer Deposition of Gallium Sulfide Films Using Hexakis(dimethylamido)digallium and Hydrogen Sulfide
作者
关键词
-
出版物
CHEMISTRY OF MATERIALS
Volume 26, Issue 2, Pages 1029-1039
出版商
American Chemical Society (ACS)
发表日期
2013-12-20
DOI
10.1021/cm4031057

向作者/读者发起求助以获取更多资源

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search