Production of Predominantly Anatase Thin Films on Various Grades of Steel and Other Metallic Substrates From TiCl4 and Ethyl Acetate by Atmospheric Pressure CVD

TiO2 thin films are deposited by atmospheric pressure (AP)CVD of TiCl4 and ethyl acetate on various substrates heated to 500?degrees C. The substrates investigated are four different grades of stainless steel (304, 304L, 316, and 316L), titanium metal, gold-coated titanium metal, and gold-coated stainless steel (316 grade). The TiO2 films are analyzed by Raman spectroscopy (RS) to determine the percentage of anatase present. Predominantly anatase films are produced on all the substrates, demonstrating the versatility of this method. Scanning electron microscopy (SEM) images reveal a marked difference in particle size between regions of high anatase content and lower anatase content, indicative of a difference in growth rate between anatase and rutile particles. Selected samples are shown to be photocatalytically active by degradation of resazurin dye by UV light. The rate of degradation is significantly faster than on the self-cleaning Saint Gobain Bioclean (TM).