Atomic Layer Deposition of LaF3 Thin Films using La(thd)3 and TiF4 as Precursors

标题
Atomic Layer Deposition of LaF3 Thin Films using La(thd)3 and TiF4 as Precursors
作者
关键词
-
出版物
CHEMICAL VAPOR DEPOSITION
Volume 14, Issue 3-4, Pages 85-91
出版商
Wiley
发表日期
2008-04-17
DOI
10.1002/cvde.200706681

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