The Atomic Layer Deposition of HfO2and ZrO2using Advanced Metallocene Precursors and H2O as the Oxygen Source

标题
The Atomic Layer Deposition of HfO2and ZrO2using Advanced Metallocene Precursors and H2O as the Oxygen Source
作者
关键词
-
出版物
CHEMICAL VAPOR DEPOSITION
Volume 14, Issue 11-12, Pages 358-365
出版商
Wiley
发表日期
2008-12-19
DOI
10.1002/cvde.200806716

向作者/读者发起求助以获取更多资源

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started