期刊
CHEMICAL ENGINEERING JOURNAL
卷 198, 期 -, 页码 61-64出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.cej.2012.05.093
关键词
Silicon production; Thermal plasma jet; Aluminothermic reduction; Tetrachlorosilane
资金
- Sumitomo Chemical Co., Ltd.
This paper proposed a new route for producing silicon at a high rate via the reduction of tetrachlorosilane with aluminum molten particles by utilizing a thermal plasma jet. High-purity aluminum particles melted and sprayed by an atmospheric dc plasma jet were reacted with tetrachlorosilane vapor. Silicon generation was confirmed in the reacted particles. The residence time was calculated to be a few milliseconds. The obtained results demonstrate the feasibility of the aluminothermic reduction process in a thermal plasma jet for rapid silicon production. (C) 2012 Elsevier B.V. All rights reserved.
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