An inorganic-organic diblock copolymer photoresist for direct mesoporous SiCN ceramic patterns via photolithography

A high resolution negative-tone-type of inorganic-organic diblock copolymer photoresist was synthesized as a novel precursor for simple and direct fabrication of SiCN ceramic mesoporous patterns with ordered nanoscale pores by using a top-down photolithographic technique and the subsequent sacrificial processes of a bottom-up self-assembled nanostructure.