期刊
CERAMICS INTERNATIONAL
卷 39, 期 5, 页码 5025-5030出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.ceramint.2012.11.100
关键词
Spin coating; Annealing; Schottky barrier; Gas sensitivity
Highly nanocrystalline ZnO modified methyl glycol thin films have been deposited on a p-type silicon substrate via the sol gel spin coating manner. The morphology of the as-deposited film was scrutinized using scanning electron microscopy. I-V characteristics of the as-prepared ZnO film under vacuum and in open air were monitored. The results showed that the ZnO films have a barrier height of 0.38 eV under vacuum and 0.62 eV in open air. The Schottky barrier height between ZnO grains was determined for different reducing gases. The ZnO film showed high sensitivity to (HS)-S-2 gas compared with other reducing gases due to the reduction of barrier height between ZnO grains. The as-prepared ZnO film was annealed at four different temperatures. X-ray diffraction manifested that the wurtzite hexagonal structure of ZnO deviated from ideality at annealing temperature greater than 650 degrees C. The barrier height of ZnO film decreased due to the increase of annealing temperature up to 650 degrees C and then decreased. The results also confirmed that the change of barrier height strongly affected the sensitivity of ZnO film. (C) 2012 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
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