Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications

标题
Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications
作者
关键词
Cellulose, Photochemistry, Photoresist, Lithography, Organic electronics, Organic thin film transistor
出版物
CELLULOSE
Volume 22, Issue 1, Pages 717-727
出版商
Springer Nature
发表日期
2014-10-15
DOI
10.1007/s10570-014-0471-4

向作者/读者发起求助以获取更多资源

Reprint

联系作者

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started