Carbon nanowalls deposited by inductively coupled plasma enhanced chemical vapor deposition using aluminum acetylacetonate as precursor

标题
Carbon nanowalls deposited by inductively coupled plasma enhanced chemical vapor deposition using aluminum acetylacetonate as precursor
作者
关键词
-
出版物
CARBON
Volume 49, Issue 15, Pages 4987-4995
出版商
Elsevier BV
发表日期
2011-07-25
DOI
10.1016/j.carbon.2011.07.002

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