Detailed statistical contact angle analyses; “slow moving” drops on inclining silicon-oxide surfaces

标题
Detailed statistical contact angle analyses; “slow moving” drops on inclining silicon-oxide surfaces
作者
关键词
Sessile drop, Silicon wafer surface, Statistical analysis, Contact angle, Inclining
出版物
JOURNAL OF COLLOID AND INTERFACE SCIENCE
Volume 447, Issue -, Pages 229-239
出版商
Elsevier BV
发表日期
2014-11-07
DOI
10.1016/j.jcis.2014.10.047

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