Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition

标题
Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume 315, Issue -, Pages 110-115
出版商
Elsevier BV
发表日期
2014-07-29
DOI
10.1016/j.apsusc.2014.07.117

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