Investigation of oxygen plasma treatment on the device performance of solution-processed a-IGZO thin film transistors

标题
Investigation of oxygen plasma treatment on the device performance of solution-processed a-IGZO thin film transistors
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume 283, Issue -, Pages 722-726
出版商
Elsevier BV
发表日期
2013-07-20
DOI
10.1016/j.apsusc.2013.07.007

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