Effect of the duty ratio on the indium tin oxide (ITO) film deposited by in-line pulsed DC magnetron sputtering method for resistive touch panel

标题
Effect of the duty ratio on the indium tin oxide (ITO) film deposited by in-line pulsed DC magnetron sputtering method for resistive touch panel
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume 258, Issue 3, Pages 1242-1248
出版商
Elsevier BV
发表日期
2011-09-26
DOI
10.1016/j.apsusc.2011.09.081

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