An undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide

标题
An undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume 257, Issue 21, Pages 9158-9163
出版商
Elsevier BV
发表日期
2011-06-13
DOI
10.1016/j.apsusc.2011.05.124

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