Reflection absorption infrared spectroscopy during atomic layer deposition of HfO2 films from tetrakis(ethylmethylamido)hafnium and water

标题
Reflection absorption infrared spectroscopy during atomic layer deposition of HfO2 films from tetrakis(ethylmethylamido)hafnium and water
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume 256, Issue 16, Pages 5035-5041
出版商
Elsevier BV
发表日期
2010-03-16
DOI
10.1016/j.apsusc.2010.03.050

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