4.7 Article Proceedings Paper

Depth profiling of organic materials using improved ion beam conditions

期刊

APPLIED SURFACE SCIENCE
卷 255, 期 4, 页码 966-969

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ELSEVIER
DOI: 10.1016/j.apsusc.2008.05.028

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TOF-SIMS; Organic depth profiling; Low energy sputtering; C-60; Cs; O-2; Bi-3

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We used the so-called dual beam mode of depth pro. ling to start a systematic investigation of organic depth pro. ling with a time of flight secondary ion mass spectrometer (TOF-SIMS) instrument. Similar to inorganic pro. ling, we found the dual beam mode beneficial because sample erosion and sample analysis are decoupled and can be optimised independently. We applied different primary projectiles such as C-60, O-2 and Cs for sputtering to a variety of organic specimens, using a wide range of impact energies. Results are discussed with respect to the feasibility of the different approaches to organic depth pro. ling in SIMS. (C) 2008 Elsevier B. V. All rights reserved.

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