4.6 Article

Controlled epitaxial integration of polar ZnO(0001) with Si(001)

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APPLIED PHYSICS LETTERS
卷 102, 期 10, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.4795126

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  1. USA National Science Foundation
  2. Directorate For Engineering
  3. Div Of Electrical, Commun & Cyber Sys [921517] Funding Source: National Science Foundation
  4. Division Of Materials Research
  5. Direct For Mathematical & Physical Scien [1304607] Funding Source: National Science Foundation

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We have grown ZnO(0001) single-crystalline thin films on Si(001) using cubic yttria-stabilized-zirconia (c-YSZ) buffer and analyzed details of epitaxy, twins, and interfaces. In-plane epitaxial relationship between ZnO and c-YSZ showed an interesting dependence on growth temperature where it changed from (0001)[(2) over bar 110](ZnO)parallel to(001)[110](c-YSZ) to (0001)[(2) over bar 110](ZnO)parallel to(001)[100](c-YSZ) as the temperature increased from 500 to 750 degrees C. At temperatures in between, a combination of these epitaxial relationships was observed. We found that the epitaxial relationships are determined by the surface termination characteristics of c-YSZ across the ZnO/c-YSZ interface. The crystallographic characteristics of c-ZnO/c-YSZ/Si(001) heterostructures can be precisely tuned to address the needs of next-generation solid-state devices. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4795126]

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