4.6 Article

Effect of substrate temperature on the magnetic properties of epitaxial sputter-grown Co/Pt

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APPLIED PHYSICS LETTERS
卷 103, 期 26, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.4856395

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资金

  1. EPSRC [EP/I011668/1, EP/I013520/1, EP/K003127/1, EP/G005176/1]
  2. Engineering and Physical Sciences Research Council [EP/K003127/1, EP/I013520/1, EP/I011668/1, EP/G005176/1] Funding Source: researchfish
  3. EPSRC [EP/G005176/1, EP/I013520/1, EP/I011668/1, EP/K003127/1] Funding Source: UKRI

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Epitaxial Co/Pt films have been deposited by dc-magnetron sputtering onto heated C-plane sapphire substrates. X-ray diffraction, the residual resistivity, and transmission electron microscopy indicate that the Co/Pt films are highly ordered on the atomic scale. The coercive field and the perpendicular magnetic anisotropy increase as the substrate temperature is increased from 100-250 degrees C during deposition of the Co/Pt. Measurement of the domain wall creep velocity as a function of applied magnetic field yields the domain wall pinning energy, which scales with the coercive field. Evidence for an enhanced creep velocity in highly ordered epitaxial Co/Pt is found. (C) 2013 AIP Publishing LLC.

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