期刊
APPLIED PHYSICS LETTERS
卷 100, 期 19, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.4712598
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资金
- U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences [DE-AC02-06CH11357, DE-SC0001805]
We have engineered an antiferromagnetic domain wall by utilizing a magnetic frustration effect of a thin iron cap layer deposited on a chromium film. Through lithography and wet etching, we selectively remove areas of the Fe cap layer to form a patterned ferromagnetic mask over the Cr film. Removing the Fe locally removes magnetic frustration in user-defined regions of the Cr film. We present x-ray microdiffraction microscopy results confirming the formation of a 90 degrees spin-density wave propagation domain wall in Cr. This domain wall nucleates at the boundary defined by our Fe mask. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4712598]
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