期刊
APPLIED PHYSICS LETTERS
卷 98, 期 18, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3585106
关键词
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资金
- Israeli Academy of Science and Arts
- Technion Fund for promotion of research
- Australian Research Council
We have investigated the nature of the residual damage in diamond crystals following the ion implantation/graphitization lift-off process, using near-edge x-ray absorption fine structure spectroscopy and transmission electron microscopy. A defective but crystalline interface is found, which displays dense pre-edge unoccupied states and an almost complete loss of the core-level C 1s exciton signature. This residual crystalline damage is resistant to standard chemical etching, however a hydrogen plasma treatment is found to completely recover a pristine diamond surface. Analysis and removal of residual ion-induced damage is considered crucial to the performance of many diamond device architectures. (C) 2011 American Institute of Physics. [doi:10.1063/1.3585106]
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