期刊
APPLIED PHYSICS LETTERS
卷 99, 期 20, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3662036
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资金
- Air Force Research Laboratory [FA87500910231]
Copper oxide resistive memory layers have been synthesized by ion implantation. Devices fabricated from off-stoichiometric Cu2O exhibited unipolar switching in forward/reverse bias without a forming voltage. The on-state conduction of these devices is likely dominated by a metallic filament, which ruptures via Joule heating to transition the device to the high resistance off-state. Technology scaling was achieved by oxygen implanting copper filled vias. The resulting via-based memory devices exhibited unipolar resistive switching down to 48 nm in diameter. (C) 2011 American Institute of Physics. [doi:10.1063/1.3662036]
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