Selective atomic layer deposition of HfO2 on copper patterned silicon substrates

标题
Selective atomic layer deposition of HfO2 on copper patterned silicon substrates
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 96, Issue 19, Pages 192105
出版商
AIP Publishing
发表日期
2010-05-12
DOI
10.1063/1.3428771

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