期刊
APPLIED PHYSICS LETTERS
卷 97, 期 12, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3491553
关键词
1; f noise; amorphous semiconductors; carrier mobility; fluctuations; gallium compounds; indium compounds; semiconductor device models; semiconductor device noise; semiconductor thin films; thin film transistors; zinc compounds
资金
- Ministry of Education, Science and Technology [2009-0068799]
- Korean Government (MOST) [2009-0083580]
- National Research Foundation of Korea [2009-0068799] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
We investigate the low-frequency noise (LFN) behaviors of amorphous indium-gallium-zinc oxide thin-film transistors in the subthreshold, Ohmic, and saturation regimes. Measured LFNs are proportional to 1/f(gamma), with gamma=0.8-0.9 in all operation regimes. It is found that the LFN behavior follows the carrier number fluctuation model in the subthreshold regime, whereas in the Ohmic and saturation regimes, it agrees well with the bulk mobility fluctuation model. We also observe that the origin of 1/f noise in the Ohmic regime changes from the bulk mobility fluctuation to the carrier number fluctuation as the channel length decreases. (C) 2010 American Institute of Physics. [doi:10.1063/1.3491553]
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