Improved two-dimensional electron gas transport characteristics in AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor with atomic layer-deposited Al2O3 as gate insulator

标题
Improved two-dimensional electron gas transport characteristics in AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor with atomic layer-deposited Al2O3 as gate insulator
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 95, Issue 22, Pages 223501
出版商
AIP Publishing
发表日期
2009-12-01
DOI
10.1063/1.3268474

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