期刊
APPLIED PHYSICS LETTERS
卷 95, 期 5, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3195684
关键词
aluminium compounds; gallium compounds; III-V semiconductors; nanofabrication; nanostructured materials; passivation; photoluminescence; semiconductor growth; semiconductor thin films; silicon compounds; vapour phase epitaxial growth; wide band gap semiconductors
This work proposes a method for fabricating 2 in. freestanding GaN substrates of high crystallographic quality and low residual strain. Arrays of GaN nanorods with sidewalls coated with silicon dioxide (SiO2) were randomly arranged on the sapphire substrate as a growth template for subsequent hydride vapor-phase epitaxy (HVPE). The passivation of the sidewalls coated with SiO2 prevents the coalescence of GaN grains in spaces between the rods, causing them to grow preferentially on the top of individual rods. The proposed method significantly improves GaN crystal quality and results in self-separation from the underlying host sapphire substrate due to the relaxation of thermal strains in the HVPE cooling-down process.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据