期刊
APPLIED PHYSICS LETTERS
卷 94, 期 14, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3112565
关键词
alumina; atomic layer deposition; cantilevers; fatigue; nanostructured materials; semiconductor thin films; silicon; transmission electron microscopy
资金
- Directorate For Engineering
- Div Of Civil, Mechanical, & Manufact Inn [0758554] Funding Source: National Science Foundation
The influence of atomic-layer-deposited alumina surface coatings on the fatigue of polycrystalline silicon thin films was investigated. Tests were performed on 2-mu m-thick notched cantilever-beam structures actuated at resonance (similar to 40 kHz) that were coated with similar to 20 nm of alumina deposited at 100 degrees C. The coated devices show a drastically different frequency evolution behavior as compared to uncoated specimens, while no surface oxide thickening during cycling is observed in bright-field transmission electron microscopy. Both results are consistent with a surface degradation mechanism for polycrystalline silicon fatigue such as the reaction-layer mechanism. The improved frequency evolution has the potential of increasing the performance of resonator-based microelectromechanical system sensors.
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