期刊
APPLIED PHYSICS LETTERS
卷 95, 期 7, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3192356
关键词
electron mobility; finite element analysis; holography; MOSFET; silicon compounds; transistors; transmission electron microscopy
资金
- European Commission [IP3: 0260019]
- French Government (MINEFI) through the NANO2012 initiative (project IMASTRAIN)
- French National Agency (ANR) [ANR-08-NANO-0 32]
Dark-field holography, a new transmission electron microscopy technique for mapping strain distributions at the nanoscale, is used to characterize strained-silicon n-type transistors with a channel width of 65 nm. The strain in the channel region, which enhances electron mobilities, is engineered by recessed Si0.99C0.01 source and drain stressors. The strain distribution is measured across an array of five transistors over a total area of 1.6 mu m wide. The longitudinal tensile strain reaches a maximum of 0.58%+/- 0.02% under the gate oxide. Theoretical strain maps obtained by finite element method agree well with the experimental results.
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