4.6 Article

Tuning the termination of the SrTiO3(110) surface by Ar+ sputtering

期刊

APPLIED PHYSICS LETTERS
卷 95, 期 2, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3180701

关键词

annealing; argon; epitaxial growth; ion-surface impact; scanning tunnelling microscopy; sputtering; strontium compounds; surface reconstruction

资金

  1. Natural Science Foundation of China [10704084]
  2. 973 Program of China [2006CB921300, 2007CB936800]

向作者/读者索取更多资源

We report a scanning tunneling microscopy study on the SrTiO3(110) surface treated with Ar+ sputtering followed by annealing. Two types of termination coexist on the surface, which are spatially identified as the 4x1 reconstructed SrTiO layer and the O layer covered by Ti-rich oxide clusters, respectively. The relative areal ratio of the two types is tuned by sputtering dose reproducibly, and monophased surface with either SrTiO or O termination is obtained. The surface is stable at temperatures up to 1100 degrees C and under oxygen partial pressures from 6x10(-5) mbar to ultra high vacuum, providing us a flexible epitaxial growth template.

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